UHV Deposition Equipment

Unveiling the technical prowess of NanoStreamS, our advanced Nanoparticle Generation Source.

Technical Operation:  NanoStreamS harnesses the potential of a modified DC sputtering source to create a metal vapor, typically from a copper disk. With meticulous control over pressure, plasma temperature, and gas mixture flow rate, this vapor undergoes condensation, mirroring the formation of droplets in clouds. Upon emergence from the source, particle growth comes to an abrupt halt, resulting in a particle beam characterized by an impressively precise size distribution of approximately +/- 20% Full Width at Half Maximum (FWHM). For those seeking even greater refinement, our in-line mass filter, tailored for high masses, awaits.

Flexibility:  These particles predominantly exist in a negatively charged, ionized state, opening up possibilities for electrostatic manipulation. This unique attribute provides users with an additional parameter to fine-tune the resultant film properties. Low-energy settings (no acceleration) encourage soft landing, preserving the particles’ natural shape. A slight energy boost promotes particle bonding with each other and the coating surface, retaining their individual shapes while yielding a remarkably porous yet stable layer. Gradually increasing the acceleration leads to progressively denser films. At significantly high energy levels, particles undergo deformation and thorough mixing, culminating in the formation of a bulk layer exhibiting exceptional adhesion. NanoStreamS stands as an exceptionally versatile instrumentation, adaptable to meet your precise application requirements.

Explore NanoStreamS and unlock a world of possibilities in nanoparticle manipulation and film deposition.